The paper said that earlier this week that the government sponsored New Energy and Industrial Technology Development Organisation (NEDO) pulled a 26 nanometre design out of its hat, and will now attempt to show how they can be mass produced using Extreme Ultraviolet (EUV) technology.
NEDO pooled efforts by an 11 strong consortium of chip makers known as Selete and used a EUV system developed by Canon to make 26 nanometre lines on a .5mm segment of a silicon substrate.
The report said that mass production of semiconductors using these technologies is likely to start in 2011. µ
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