Extreme Ultraviolet Lithography development too slow

BOFFINS working for Intel say that the development of extreme ultraviolet (EUV) lithography is too slow to be any use yet.

Mike Mayberry, Intel's director of components research and vice president of the technology manufacturing group at told Electronic Engineering Times that the technique had not developed and was about the same as a year ago.

He said that there was still a lack of a suitable source, defect-free masks, and resists to work well enough in production. While the industry is working hard to solve these issues, the challenges remain, he said.

Chipzilla had altered its lithography roadmap in February because it couldn't obtain the EUV tools and materials in time.

Now it seems it plans to extend mass producte chips at 32nm by using immersion lithography. More here. µ